Method of forming semiconducting materials and barriers

Details Method of forming semiconducting materials and barriers Method of forming semiconducting materials and barriers

1977-12-05

1980-10-07

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

204164, 427 84, 427 85, 427 86, 427164, B05D 306

Patent

active

042268974

ABSTRACT:
In a gaseous glow-discharge process for coating a substrate with semiconductor material, a variable electric field in the region of the substrate and the pressure of the gaseous material are controlled to produce a uniform coating having useful semiconducting properties. Electrodes having concave and cylindrical configurations are used to produce a spacially varying electric field. Twin electrodes are used to enable the use of an AC power supply and collect a substantial part of the coating on the substrate. Solid semiconductor material is evaporated and sputtered into the glow discharge to control the discharge and improve the coating. Schottky barrier and solar cell structures are fabricated from the semiconductor coating. Activated nitrogen species is used to increase the barrier height of Schottky barriers.

REFERENCES:
patent: 3437511 (1969-04-01), Hough
patent: 3655438 (1972-04-01), Sterling et al.
patent: 4059461 (1977-11-01), Fan et al.
patent: 4064521 (1977-12-01), Carlson
Chittick, "Journ. of Non-Crystalline Solids", 3 (1970), 255-270.

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