Method of forming semiconducting amorphous silicon films from th

Details Method of forming semiconducting amorphous silicon films from th Method of forming semiconducting amorphous silicon films from th

1987-06-22

1988-08-09

Weisstuch, Aaron

Fishing, trapping, and vermin destroying

437 4, 427 74, 423349, 136258, H01L 21205

Patent

active

047628081

ABSTRACT:
The invention relates to a method of forming amorphous, photoconductive, and semiconductive silicon films on a substrate by the vapor phase thermal decomposition of a fluorohydridodisilane or a mixture of fluorohydridodisilanes. The invention is useful for the protection of surfaces including electronic devices.

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Auguelli and Murri, Mat'ls. Chem. and Phys. (Switzerland) 9, 301-5 (1983).

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