Coating processes – Coating by vapor – gas – or smoke – Base includes an inorganic compound containing silicon or...
Patent
1987-12-31
1992-01-21
Beck, Shrive
Coating processes
Coating by vapor, gas, or smoke
Base includes an inorganic compound containing silicon or...
427162, 427167, 4272551, 4272552, C23C 1600, C23C 1646
Patent
active
050826964
ABSTRACT:
The invention relates to the chemical vapor deposition of dihalogenated silanes to form stable, abrasion resistant, photoconductive, dopable semiconductor amorphous films on substrates. Additional hydrogen and plasma discharge conditions are not necessary to practice the invention.
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Beck Shrive
Bittell James E.
Dow Corning Corporation
Gobrogge Roger E.
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