Method of forming resistance film

Details Method of forming resistance film Method of forming resistance film

2007-11-27

2007-11-27

Talbot, Brian K. (Department: 1762)

Coating processes

Electrical product produced

Resistor for current control

C427S189000, C427S372200

Reexamination Certificate

active

11014950

ABSTRACT:
The invention provides a method of forming a resistance film with even thickness and at high speed even in a substrate having micro depressions and projections in its surface. A fine particle dispersion solution is prepared by adding a solution which decreases the absolute value of a ξ potential at the fine particles and a solution which decreases dispersion stability of the fine particles into a solution in which metal oxide fine particles are stably dispersed, a substrate having an insulating surface is immersed in the fine particle dispersion solution to deposit a fine particle aggregation film, and then a resistance film is obtained by performing heat treatment.

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