Method of forming resist pattern on substrate

Details Method of forming resist pattern on substrate Method of forming resist pattern on substrate

1988-02-24

1989-03-21

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 5, 430296, 430311, 430325, 430326, 430328, 430329, 437229, 2504922, 2504923, G03C 500

Patent

active

048142441

ABSTRACT:
A method of forming resist pattern is disclosed. After the resist pattern is formed, an ion beam is irradiated on the resist pattern. The energy of the ion beam is controlled in every segments of the resist pattern by a predicted deviation data stored beforehand, so that the unfavorable deviation of the resist pattern is minimized.

REFERENCES:
patent: 4341592 (1982-07-01), Shortes et al.

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