Method of forming resist pattern and thermally stable and highly

Details Method of forming resist pattern and thermally stable and highly Method of forming resist pattern and thermally stable and highly

1990-03-20

1991-02-26

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Nonsilver image

430 18, 430192, 430193, 430326, G03F 7023, G03F 730

Patent

active

049961225

ABSTRACT:
Positive photoresist compositions are provided which contain

REFERENCES:
patent: 3201239 (1965-08-01), Neugebauer et al.
patent: 4059449 (1977-11-01), Rosenkranz et al.
patent: 4377631 (1983-03-01), Toukhy et al.
patent: 4439516 (1984-03-01), Cernigliano et al.
patent: 4499171 (1985-02-01), Hosaka et al.
patent: 4529682 (1985-07-01), Toukhy
patent: 4731319 (1988-03-01), Kohara et al.
Hiraoka, H., Materials for Microlithography, ACS Symposium Series #226, pp. 340-359, 1984.

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