Method of forming resist pattern, and exposure device

Details Method of forming resist pattern, and exposure device Method of forming resist pattern, and exposure device

2005-10-18

2005-10-18

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S052000, C355S067000

Reexamination Certificate

active

06956641

ABSTRACT:
A device for exposure of an object surface having a predetermined shrinkage rate during a baking process of the object. The device includes an optical system having a light source irradiating light towards a target location. A filter is provided between the target location and the light source. The filter has a transmission rate that is adjustable to at least three different levels and which passes light from the light source therethrough.

REFERENCES:
patent: 5648198 (1997-07-01), Shibata
patent: 5742362 (1998-04-01), Chikamichi
patent: 5998069 (1999-12-01), Cutter et al.
patent: 6097361 (2000-08-01), Rohner
patent: 6333780 (2001-12-01), Tsukuda
patent: 6486939 (2002-11-01), Lin
patent: 2001/0007732 (2001-07-01), Iwasaki et al.
patent: 61-166130 (1986-07-01), None
patent: 11-119443 (1999-04-01), None

Affiliated with

Also associated with

Rating

Method of forming resist pattern, and exposure device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming resist pattern, and exposure device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming resist pattern, and exposure device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3491847