Method of forming PZT ferroelectric film

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S681000

Reexamination Certificate

active

07026169

ABSTRACT:
A method of forming a ferroelectric film including a complex oxide of PZT family on a metal film formed of Pt by using a metalorganic chemical vapor deposition method. At first, supply of Pb is started to form an alloy film of Pb and Pt on the metal film. Supply of Ti is then started to form an initial crystal nuclei of PbTiO3on the alloy film. Then, supply of Zr is started to form a crystal grown layer of the complex oxide of PZT family on the initial crystal nuclei.

REFERENCES:
patent: 5714194 (1998-02-01), Komai et al.
patent: 2003/0175425 (2003-09-01), Tatsumi

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming PZT ferroelectric film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming PZT ferroelectric film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming PZT ferroelectric film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3599870

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.