Method of forming platinum-silicon-enriched diffused aluminide c

Details Method of forming platinum-silicon-enriched diffused aluminide c Method of forming platinum-silicon-enriched diffused aluminide c

1990-12-17

1991-10-15

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

428652, C25D 1304

Patent

active

050571966

ABSTRACT:
A platinum-silicon powder is electrophoretically deposited on a nickel or cobalt base superalloy substrate. The deposited powder is heated to form a transient liquid phase on the substrate and initiate diffusion of Pt and Si into the substrate. An aluminum-chromium powder is then electrophoretically deposited on the Pt-Si enriched substrate and diffusion heat treated to form a corrosion- and oxidation-resistant Pt-Si enriched diffused aluminide coating on the substrate. The presence of both Pt and Si in the aluminide coating unexpectedly improves coating ductility as compared to a Pt-enriched diffused aluminide coating without Si on the same substrate material.

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