Method of forming photoresist pattern using hot plate oven

Details Method of forming photoresist pattern using hot plate oven Method of forming photoresist pattern using hot plate oven

2005-04-05

2005-04-05

McPherson, John A. (Department: 1756)

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

C219S443100, C392S416000, C392S418000, C430S311000, C430S330000, C118S724000, C118S725000

Reexamination Certificate

active

06875956

ABSTRACT:
A hot plate oven used in a thermal process of forming an ultrafine photoresist pattern and a method of forming a pattern using the same. More particularly, a hot plate oven used to flow photoresist under the high pressure in the sealed oven during a resist flow process.

REFERENCES:
patent: 5395781 (1995-03-01), Wilhoit
patent: 6246030 (2001-06-01), Matsuyama
patent: 6358672 (2002-03-01), Jeoung et al.

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