Method of forming photopolymeric molding pattern

Details Method of forming photopolymeric molding pattern Method of forming photopolymeric molding pattern

1984-05-25

1986-06-17

Woo, Jay H.

Plastic and nonmetallic article shaping or treating: processes

Carbonizing to form article

Agglomeration or accretion

264219, 4251744, B29C 3508

Patent

active

045955433

ABSTRACT:
A novel molding pattern and method of making the same comprises the use of first and second image negatives sequentially positioned on opposed sides of a light sensitive resinous mass. Ultraviolet light waves are sequentially passed through each negative for user-selectable time periods so as to sensitize the portions of the resinous mass adjacent the image areas of each negative. Upon completion, a pattern is presented having a relatively offset primary image and a secondary background image with the secondary image also being in relief relative to a background area. The pattern is suitable for use in a casting-to-shape process or the like and eliminates the need for providing an engraved pattern with the primary and/or secondary images engraved thereon.

REFERENCES:
patent: 2595734 (1952-05-01), Toulmin, Jr.
patent: 4038123 (1977-07-01), Sammis
patent: 4064205 (1977-12-01), Landsman
patent: 4144300 (1979-03-01), Breeden
patent: 4294782 (1981-10-01), Froehlig

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