Method of forming photomask and pattern and method of forming a

Details Method of forming photomask and pattern and method of forming a Method of forming photomask and pattern and method of forming a

1999-01-13

2000-10-24

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061364797

ABSTRACT:
A photomask where interconnection patterns and a contact hole pattern are drawn is used. According to the method, an overlay error due to a manufacturing error among reticles can be restricted.

REFERENCES:
patent: 5476736 (1995-12-01), Tanabe
patent: 5952160 (1999-09-01), Bakeman, Jr. et al.

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