Method of forming patterned conductor lines

Details Method of forming patterned conductor lines Method of forming patterned conductor lines

1982-03-31

1984-12-11

Hess, Bruce H.

Stock material or miscellaneous articles

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Including aperture

428195, 428209, 428901, 430296, 430313, 430318, 430320, 430326, B32B 324, G03C 500

Patent

active

044877951

ABSTRACT:
A conductor pattern consisting of conductor lines is formed in an electronic device by an electron-beam lithography process using a positive resist. After the formation of a positive resist layer on a conductive layer, a linear pattern of latent images is formed by exposure of an electron-beam along the contours of the conductor lines to be formed. The positive resist layer is developed and then serves as a mask against an etchant. The conductive layer is selectively etched to divide it into the patterned conductor lines and remaining conductor portions.

REFERENCES:
patent: 3799777 (1974-03-01), O'Keefe et al.
patent: 4355094 (1982-10-01), Pampalone et al.

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