Method of forming pattern having step difference and method...

Coating processes – Roller applicator utilized

Reexamination Certificate

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Details

C427S058000, C427S420000, C427S421100, C427S424000

Reexamination Certificate

active

07494695

ABSTRACT:
A method of forming a pattern having a step difference and a method of making a thin film transistor and an LCD device using the method of forming the pattern. The method of forming a pattern having a step difference includes forming a first pattern having a predetermined shape in a first printing roll, rotating the first printing roll on a substrate to transfer the first pattern onto the substrate, forming a second pattern having a predetermined shape in a second printing roll, and rotating the second printing roll on the substrate onto which the first pattern is transferred, to transfer the second pattern onto the substrate.

REFERENCES:
patent: 6408753 (2002-06-01), Finn et al.
patent: 6940578 (2005-09-01), Baek et al.
patent: 05-011270 (1993-01-01), None
patent: 06-000939 (1994-01-01), None
patent: 06-023948 (1994-02-01), None
patent: 06-166165 (1994-06-01), None
patent: 07-140314 (1995-06-01), None
patent: 11-058921 (1999-03-01), None
patent: 11-091229 (1999-04-01), None
patent: 11-198337 (1999-07-01), None
patent: 2000-70820 (2000-03-01), None
patent: 2000-289320 (2000-10-01), None
patent: 2001-056405 (2001-02-01), None

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