Method of forming pattern having optical angle in charged partic

Details Method of forming pattern having optical angle in charged partic Method of forming pattern having optical angle in charged partic

1994-08-08

1995-07-18

Trans, Vincent N.

Boots, shoes, and leggings

364488, 2504922, H01J 37302

Patent

active

054347955

ABSTRACT:
A charged particle exposure system uses a method for accurately and efficiently generating a required pattern having an optional angle .theta.. The method uses a reference isosceles right triangle. According to the reference triangle, a plurality of rectangular beams are formed. Each of the rectangular beams is multiplied by tan .theta. of the optional angle .theta., thereby preparing data of beams necessary for forming the required pattern.

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patent: 4996434 (1991-02-01), Tanaka

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