Method of forming oxide superconductor thick film

Details Method of forming oxide superconductor thick film Method of forming oxide superconductor thick film

2006-12-15

2009-12-29

Kopec, Mark (Department: 1796)

Superconductor technology: apparatus, material, process

High temperature devices, systems, apparatus, com- ponents,...

Superconductor next to superconductor

C505S471000, C505S741000, C427S062000

Reexamination Certificate

active

07638463

ABSTRACT:
To provide an oxide superconductor thick film formation method that can enhance adhesiveness of a Bi2223 thick film to a body to be processed on which the Bi2223 thick film is formed, and increase a cross-sectional area of the Bi2223 thick film, without a decrease in Jc of the Bi2223 thick film. A mixture of a compound oxide having composition Bi2212 and Pb is applied to a surface of the body to be processed, and burned to form a first thick film. An oxide superconductor thick film expressed by a general formula (Bi, Pb)2+aSr2Ca2Cu3OZ(where −0.1≦a≦0.5) is formed on the first thick film.

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