Method of forming oxide superconductor patterns

Details Method of forming oxide superconductor patterns Method of forming oxide superconductor patterns

1992-03-13

1993-09-28

King, Roy

Superconductor technology: apparatus, material, process

High temperature , per se

Having tc greater than or equal to 150 k

505701, 505702, 505706, 505730, 427 62, 427 63, 427309, 156654, 1566591, 156667, B05D 512

Patent

active

052486630

ABSTRACT:
A method of forming a superconductor pattern in which at lest a pair of electrodes is formed on a substrate in spaced, facing relationship nd an oxide superconductor thin film having a unit lattice which assumes a laminar structure then is formed on the substrate, extending between and contacting the electrodes. The superconductor pattern obtained by this method suffers less degradation of the superconductor thin film, in comparison with that of patterns formed by the prior art methods, and the decrease of the critical current density as a function of increasing temperature is extremely small.

REFERENCES:
patent: 5071832 (1991-12-01), Iwamatsu

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