Method of forming optical light guides through silicon

Details Method of forming optical light guides through silicon Method of forming optical light guides through silicon

1994-07-29

1995-07-11

Fourson, George

Etching a substrate: processes

Forming or treating optical article

385143, 216 79, 216 48, 216 99, 216 51, 216 39, H01L 21302

Patent

active

054317754

ABSTRACT:
A method of forming optical light guides through silicon is disclosed wherein such light guides extend from a first (or front) surface along a preferred crystallographic direction to a second (or back) surface.

REFERENCES:
patent: 4919749 (1990-04-01), Mauger et al.
patent: 5308442 (1994-05-01), Taub et al.
K. E. Bean, "Anisotropic Etching of Silicon" IEEE Trans. Electron Devices, ED-25(10), 1185 (1978).
L. Levy, "Applied Optics," John Wiley & Sons, New York, 1980, Appendix 13.2, pp. 231-233.

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