Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1991-03-14
1993-03-30
Beck, Shrive
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427125, 427250, 427165, 427166, 427314, 427531, 378 70, B05D 306, G21K 700
Patent
active
051982625
ABSTRACT:
Disclosed herein is a method of producing a mirror for electromagnetic radiations of short wavelengths, the method including forming a film on a substrate having a surface roughness smaller than 5 .ANG. by bombardment with a metal, which is at least partly in the form of cluster ions, in a vacuum chamber under the conditions that the accelerating voltage applied to the accelerating electrode is of 3-7 kV, the temperature of the substrate is kept at 0.degree.-60.degree. C., the pressure in the vacuum chamber is kept below 1.times.10.sup.-7 Torr, and the film is formed at a rate of 0.5-5 .ANG./s until it becomes 50-1000 .ANG. thick. A mirror form in accordance with this method has a high reflectivity which has never been achieved by conventional methods.
REFERENCES:
patent: 4091138 (1978-05-01), Takagi et al.
patent: 4152478 (1979-05-01), Takagi
patent: 4811690 (1989-03-01), Kawagoe et al.
patent: 4924490 (1990-05-01), Hashimoto et al.
patent: 4959242 (1990-09-01), Itoh
"X-Ray Optical Elements and Their Applications" by Sadao Aoki, in Applied Physics, vol. 56 pp. 342-351, 1986.
"Vacuum Deposition" by Yamamoto in Metal Surface Technology, vol. 30, No. 5, 1979, pp. 225-231.
"Reflectance of X-Ray Mirrors from 3.8 to 50 keV (3.3 to 0.25A)" D. H. Bilderback-SPIE vol. 315 (1981) pp. 90-102.
Hashimoto Yoichi
Yamada Isao
Beck Shrive
King Roy V.
Mitsubishi Denki & Kabushiki Kaisha
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