Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Patent
1993-06-02
1995-10-17
Utech, Benjamin L.
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
427531, 427566, 4272481, 4272553, 427294, 20419216, B05A 306, C23C 1600
Patent
active
054589282
ABSTRACT:
The disclosed method of forming a high-function material film such as a ZrN thin film on a substrate in a vacuum chamber allows the color tone and uniformity of the film to be controlled. Gaseous nitrogen and gaseous oxygen, or nitrogen ions and oxygen ions, are supplied to the substrate while hard material atoms such as Zr atoms are emitted from an evaporation source toward the substrate. A supply partial pressure of the gaseous oxygen is set at a value within a range from about 10.sup.-5 Torr to about 10.sup.-4 Torr.
REFERENCES:
patent: 2539149 (1951-01-01), Miller
patent: 3900636 (1975-08-01), Curry et al.
patent: 4861669 (1989-08-01), Gillery
patent: 4920006 (1990-04-01), Gillery
patent: 4933058 (1990-06-01), Bache et al.
patent: 4938857 (1990-07-01), Gillery
patent: 5053245 (1991-10-01), Kiyamo et al.
patent: 5064682 (1991-11-01), Kiyama et al.
Domoto Yoichi
Hirano Hitoshi
Kiyama Seiichi
Kuramoto Keiichi
Fasse W. F.
Fasse W. G.
Sanyo Electric Co,. Ltd.
Utech Benjamin L.
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