Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating
Reexamination Certificate
2006-06-13
2006-06-13
Padgett, Marianne (Department: 1762)
Coating processes
Coating by vapor, gas, or smoke
Carbon or carbide coating
C427S255370, C427S255390, C427S579000, C427S577000, C427S489000, C438S780000, C438S784000, C438S786000, C438S789000, C438S790000
Reexamination Certificate
active
07060323
ABSTRACT:
A material containing, as a main component, an organic silicon compound represented by the following general formula:in-line-formulae description="In-line Formulae" end="lead"?R1xSi(OR2)4-xin-line-formulae description="In-line Formulae" end="tail"?(where R1is a phenyl group or a vinyl group; R2is an alkyl group; and x is an integer of 1 to 3) is caused to undergo plasma polymerization or react with an oxidizing agent to form an interlayer insulating film composed of a silicon oxide film containing an organic component. As the organic silicon compound where R1is a phenyl group, there can be listed phenyltrimethoxysilane or diphenyldimethoxysilane. As the organic silicon compound where R1is a vinyl group, there can be listed vinyltrimethoxysilane or divinyldimethoxysilane.
REFERENCES:
patent: 4232848 (1980-11-01), Kimber
patent: 4693927 (1987-09-01), Nishikawa et al.
patent: 4938995 (1990-07-01), Giordano et al.
patent: 5198263 (1993-03-01), Stafford et al.
patent: 5496595 (1996-03-01), Ueda et al.
patent: 5637351 (1997-06-01), O'Neal et al.
patent: 5674638 (1997-10-01), Grill et al.
patent: 5900290 (1999-05-01), Yang et al.
patent: 6033979 (2000-03-01), Endo
patent: 6051321 (2000-04-01), Lee et al.
patent: 6066577 (2000-05-01), Cooney, III et al.
patent: 6071797 (2000-06-01), Endo et al.
patent: 6121162 (2000-09-01), Endo
patent: 6150258 (2000-11-01), Mountsier et al.
patent: 6197704 (2001-03-01), Endo et al.
patent: 6218299 (2001-04-01), Akahori et al.
patent: 6660656 (2003-12-01), Cheung et al.
patent: 6716770 (2004-04-01), O'Neill et al.
patent: 3531578 (1989-03-01), None
patent: 03101123 (1991-04-01), None
patent: 07-058100 (1995-03-01), None
patent: 07-183292 (1995-07-01), None
patent: 08-083842 (1996-03-01), None
patent: 08-143677 (1996-06-01), None
patent: 08-236519 (1996-09-01), None
patent: 09-027487 (1997-01-01), None
patent: 09-069518 (1997-03-01), None
patent: 09-237783 (1997-09-01), None
patent: 09-246263 (1997-09-01), None
patent: 09-246264 (1997-09-01), None
patent: 10-125674 (1998-05-01), None
patent: 10-214829 (1998-08-01), None
patent: 10-242143 (1998-09-01), None
patent: 10-284486 (1998-10-01), None
patent: 10-326830 (1998-12-01), None
patent: 10-340899 (1998-12-01), None
patent: 3226524 (2001-08-01), None
patent: 2002-009067 (2002-01-01), None
patent: 2002-016061 (2002-01-01), None
patent: 2002-033316 (2002-01-01), None
patent: 3260352 (2002-01-01), None
patent: 3538159 (2004-03-01), None
F. Durrant et al., “Fluorine-Containing Amorphous Hydrogenated Carbon Films”, Thin Solid Films, vol. 281/282, No. 1/02, Aug. 1, 1996, pp. 294-297.
T. Wiedman et al., “New photodefinable glass etch masks for entirely dry photolithography: Plasma deposited organosilicon hydride polymers”, Applied Physics Letters, American Institute of Physics, vol. 62, No. 4, Jan. 25, 1993, pp. 372-374.
Lang et al., “Vapor Deposition of Very Low K Polymer Films, Poly(naphthalene), Poly(fluorinated Naphthalene)”, by Mat. Res. Soc. Symp. Proc., vol. 381, 1995, Materials Research Society, pp. 45-50.
Aoi Nobuo
Arai Koji
Sawada Kazuyuki
Sugahara Gaku
McDermott Will & Emery LLP
Padgett Marianne
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