Method of forming high purity fused silica having high resistanc

Details Method of forming high purity fused silica having high resistanc Method of forming high purity fused silica having high resistanc

1995-04-14

1997-04-01

Czaja, Donald E.

Glass manufacturing

Processes

With shaping of particulate material and subsequent fusing...

65 176, 65 301, 65 3013, C03B 1901

Patent

active

056161590

ABSTRACT:
High purity fused silica glass which is highly resistant to optical damage by ultraviolet radiation in the laser wavelength of about 300 nm or shorter is produced. In particular, a fused silica optical member or blank exhibits substantially no optical damage up to 10.sup.7 pulses (350 mJ/cm.sup.2) at the KrF laser wavelength region of about 248 nm, and at the ArF laser wavelength region of about 193 nm.

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Yamagata, "Improvement of Excimer Laser Durability of Silica Glass", Transactions of the Materials Research Society of Japan, vol. 8, pp. 82-96 (1992).
Escher, "KrF Laser Induced Color Centers in Commercial Fused Silicas", SPIE, vol. 998 Excimer Beam Applications, pp. 30-37 (1988).
Japanese Patent Abstract 40-10228, "A Process of Producing a Quartz Glass Article", Publication Date May 24, 1965.

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