Semiconductor device manufacturing: process – Chemical etching
Reexamination Certificate
2006-06-13
2009-10-27
Blum, David S (Department: 2813)
Semiconductor device manufacturing: process
Chemical etching
C257SE21039
Reexamination Certificate
active
07608541
ABSTRACT:
A method of forming fine pattern includes providing a film, forming a photo-resist pattern on the film, ashing the photo-resist pattern and patterning the film by using the ashed photo-resist pattern as a mask.
REFERENCES:
patent: 6514672 (2003-02-01), Young et al.
patent: 6620690 (2003-09-01), Lee et al.
patent: 2002/0090827 (2002-07-01), Yokoshima
Cho Heung Lyul
Yoo Soon Sung
Blum David S
Holland & Knight LLP
LG Display Co. Ltd.
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