Semiconductor device manufacturing: process – Having organic semiconductive component
Reexamination Certificate
2011-03-15
2011-03-15
Bryant, Kiesha R (Department: 2891)
Semiconductor device manufacturing: process
Having organic semiconductive component
C257SE51027
Reexamination Certificate
active
07906367
ABSTRACT:
A method of forming a fine particle pattern, includes: forming a layer containing a silane coupling agent having a thiol group, an amino group, a hydroxyl group, a carboxyl group, or a sulfo group, each of which is protected by a photolytic protective group on a top-most surface of a substrate; exposing the substrate to light in a pattern; immersing the substrate into a colloidal solution in which metal atom-containing fine particles are dispersed; and allowing the metal atom-containing fine particles to selectively adhere onto an exposed area.
REFERENCES:
patent: 6755953 (2004-06-01), Baba
patent: 7079250 (2006-07-01), Mukai
patent: 7204915 (2007-04-01), Kitade et al.
patent: 7220482 (2007-05-01), Mino et al.
patent: 2004/0001947 (2004-01-01), Kawamura et al.
patent: 2004/0038506 (2004-02-01), Kataoka et al.
patent: 2004/0067434 (2004-04-01), Kano et al.
patent: 2004/0209203 (2004-10-01), Kano et al.
patent: 2005/0064108 (2005-03-01), Kano et al.
patent: 2005/0176863 (2005-08-01), Yokota et al.
patent: 2005/0208428 (2005-09-01), Kawamura et al.
patent: 2005/0214693 (2005-09-01), Kano et al.
patent: 2005/0276912 (2005-12-01), Yamamoto et al.
patent: 2007/0003463 (2007-01-01), Ajiri
patent: 2007/0212883 (2007-09-01), Kano et al.
patent: 2007/0218373 (2007-09-01), Ito et al.
patent: 2007/0218398 (2007-09-01), Ito et al.
patent: 2008/0014581 (2008-01-01), Nakahara et al.
patent: 2000-356587 (2000-12-01), None
patent: 2001-168317 (2001-06-01), None
patent: 2002-80481 (2002-03-01), None
patent: 2003-168606 (2003-06-01), None
patent: 2003-268592 (2003-09-01), None
patent: 2003-321479 (2003-11-01), None
patent: 2005-190624 (2005-07-01), None
Aurèlien Blanc, et al., “Wavelength-Controlled Orthogonal Photolysis of Protecting Groups”, J. Org. Chem. vol. 67, 2002, pp. 5567-5577. (with Supplementary material, pp. S1-S77).
Grant A. Krafft, et al., “Photoactivable Fluorophores. 3. Synthesis and Photoactivation of Fluorogenic Difunctionalized Fluoresceins”, et al., J. Am. Chem. Soc., vol. 110, 1988, pp. 301-303.
Alan R. Katritzky, “Model Compounds of Caged Capsaicin: Design, Synthesis, and Photoreactivity”, J. Org. Chem., vol. 68, 2003, pp. 9100-9104.
Anya Igwe U
Bryant Kiesha R
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
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