Specialized metallurgical processes – compositions for use therei – Processes – Producing or purifying free metal powder or producing or...
Reexamination Certificate
2005-11-23
2008-09-02
Wyszomierski, George (Department: 1793)
Specialized metallurgical processes, compositions for use therei
Processes
Producing or purifying free metal powder or producing or...
C075S369000, C423S592100
Reexamination Certificate
active
07419529
ABSTRACT:
An object of the present invention is to provide a method of forming fine particles on a substrate in which reoxidization of reduced fine particles is suppressed. Reduced fine particles (FeO fine particles) are formed by embedding metal oxide fine particles (Fe2O3fine particles) fixed on a p type silicon semiconductor substrate into a silicon oxidized film, and carrying out a heat treatment in a reducing gas atmosphere. Presence of the silicon oxidized film enables suppression of reoxidization of the reduced fine particles (FeO fine particles) due to exposure to the ambient air.
REFERENCES:
patent: 5328681 (1994-07-01), Kito et al.
patent: 6121075 (2000-09-01), Yamashita
patent: 6303516 (2001-10-01), Morita et al.
patent: 7015139 (2006-03-01), Yamashita
patent: 2004/0028694 (2004-02-01), Young et al.
patent: 2002-223016 (2002-08-01), None
patent: 2005-118963 (2005-05-01), None
Matsukawa Nozomu
Ueda Michihito
Yamashita Ichiro
Yoshii Shigeo
Matsushita Electric - Industrial Co., Ltd.
McDermott Will & Emery LLP
Wyszomierski George
LandOfFree
Method of forming fine particle array on substrate and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of forming fine particle array on substrate and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming fine particle array on substrate and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3971977