Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2006-02-03
2009-06-16
Toledo, Fernando L (Department: 2895)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S584000, C438S674000, C257SE21174
Reexamination Certificate
active
07547567
ABSTRACT:
A method of forming a film pattern by disposing functional liquid on a substrate includes: forming banks on the substrate; disposing the functional liquid in regions partitioned by the banks; and drying the functional liquid disposed on the substrate. The forming of the banks includes forming a thin film on the substrate, the thin film being made of a material for forming the banks, performing lyophobic treatment on a surface of the thin film, and patterning the thin film into the shapes of the banks.
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Hirai Toshimitsu
Moriya Katsuyuki
Harness & Dickey & Pierce P.L.C.
Seiko Epson Corporation
Toledo Fernando L
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