Method of forming electron-transmissive apertures in a color sel

Details Method of forming electron-transmissive apertures in a color sel Method of forming electron-transmissive apertures in a color sel

1975-01-06

1976-05-11

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 36, 156 11, G03C 500

Patent

active

039559815

ABSTRACT:
A method of forming electron-transmissive apertures in a color selection mask for use in a color cathode ray tube. The method includes providing an electrically conductive preformed blank having a relatively thin aperture-defining layer and a relatively thick substrate layer. Two photoresist layers are deposited in succession on the aperture-defining layer. The first photoresist layer is caused to have an array of aperture elements, said pattern elements having the desired ultimate mask aperture size. The second photoresist layer is caused to have an array of aperture elements which are superimposed over the array of aperture elements in the first photoresist coating and correspondingly distributed, a predetermined group of the said aperture elements being of a smaller size than the desired ultimate mask aperture size. The shadow mask blank is then etched through, using the array of apertures in the second photoresist coating as an etchant mask. The second photoresist layer is then stripped and the bared portions of the aperture-defining layer in the mask blank are etched in a second etching operation to thereby produce a mask blank in which is formed the ultimate sized and shaped electron-transmissive apertures.

REFERENCES:
patent: 3652895 (1972-03-01), Tsuneta et al.
patent: 3653900 (1972-04-01), Black
patent: 3721592 (1973-03-01), De Werdt
patent: 3794873 (1974-02-01), Kaplan
patent: 3905079 (1975-09-01), Kanai et al.

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