Method of forming diamond film

Details Method of forming diamond film Method of forming diamond film

1990-06-27

1991-04-23

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427249, 427294, 427350, 427377, B05D 306

Patent

active

050099230

ABSTRACT:
A method of forming a diamond film on a substrate comprises the steps of depositing carbon on said substrate in vacuum by vapor deposition, and irradiating accelerated ions onto said substrate, said ions being obtained by ionizing a gas composed of at least one of a hydrogen gas, inert gases, hydrocarbon gases, organic compound gases and silicon base gases.

REFERENCES:
patent: 4490229 (1984-12-01), Mirtich et al.
patent: 4503125 (1985-03-01), Nelson et al.
patent: 4618505 (1986-10-01), MacIver et al.
Weissmantel, C., "Preparation and Properties of Hard i-C and i-BN Coatings", Thin Solid Films, 96:31-44 (1982).
Patent Abstracts of Japan, vol. 10, No. 49, (C-330) [2106], Feb. 26, 1986; and JP-A-60 195 094 (Kogyo Gijutsuin) 3-10-85.

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