Method of forming diamond devices having textured and highly ori

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

117103, 117929, 427590, 423446, C30B 2904

Patent

active

058039678

ABSTRACT:
A method of forming devices having textured and highly oriented diamond layers includes the steps of forming a plurality of diamond nucleation sites on a substrate and then growing diamond on the sites so merge and form a continuous diamond layer having {100} and {111} facets. The growing step is performed by repeatedly cycling between first growth parameters, which favor growth of the nucleation sites in a direction normal to the {100} facets relative to growth in a direction normal to the {111} facets, and second growth parameters, which favor growth of the {100} facets relative to growth of the {111} facets, in sequence. This is continued until a diamond layer of desired thickness is obtained having large and substantially coplanar {100} facets. The first growth parameters are selected so that the rate of growth of diamond in a direction normal to the exposed {100} facets of the layer is preferably between about one and one quarter (1.25) times and one and three quarter (1.75) times the rate of growth of diamond in a direction normal to the exposed {111} facets of the layer. The second growth parameters are also preferably selected so that the rate of growth of diamond in a direction normal to the exposed {100} facets is between about 0.9 and one and one half (1.5) times the rate of growth of diamond in a direction normal to the exposed {111} facets and more preferably, less than about 1.44 times that rate of growth. The method also includes the step of etching the diamond layer at intermediate stages of the growing step to remove defects therefrom. In particular, the etching step includes the step of etching the diamond layer between cycling from the first growth parameters to the second growth parameters. In accordance with these steps, a textured and highly oriented polycrystalline diamond layer can be achieved having a smooth surface, a high degree of registry between individual grains thereof and electrical properties approaching those of monocrystalline diamond.

REFERENCES:
patent: 4806900 (1989-02-01), Fujimori et al.
patent: 5066938 (1991-11-01), Kobashi et al.
patent: 5086014 (1992-02-01), Miyata et al.
patent: 5089802 (1992-02-01), Yamazaki
patent: 5107315 (1992-04-01), Kumagai et al.
patent: 5124179 (1992-06-01), Garg et al.
patent: 5126206 (1992-06-01), Garg et al.
patent: 5147687 (1992-09-01), Garg et al.
patent: 5183530 (1993-02-01), Yamazaki
patent: 5186973 (1993-02-01), Garg et al.
patent: 5212401 (1993-05-01), Humphreys et al.
patent: 5221411 (1993-06-01), Narayan
patent: 5254862 (1993-10-01), Kalyankjumar et al.
patent: 5278431 (1994-01-01), Das
patent: 5298286 (1994-03-01), Yang et al.
patent: 5300188 (1994-04-01), Tessmer et al.
patent: 5304461 (1994-04-01), Inoue et al.
patent: 5353737 (1994-10-01), Koyama et al.
patent: 5358754 (1994-10-01), Kobashi et al.
patent: 5371383 (1994-12-01), Miyata et al.
patent: 5391509 (1995-02-01), Matsukawa et al.
patent: 5391895 (1995-02-01), Dreifus
patent: 5397428 (1995-03-01), Stoner et al.
Stoner et al., Highly Oriented, Textured Diamond Films of Silicon Via Bias-Enhanced Nucleation and Texture Growth, J. Mater. Res., vol. 8, No. 6, Jun. 1993, pp. 1334-1340.
Stoner et al., Bias Assisted Etching of Diamond in a Conventional Chemical Vapor Deposition Reactor, Appl. Phys. Letter 62 (15), 12 Apr. 1993, pp. 1803-1805.
Wild et al., Chemical Vapour Deposition and Characterization of Smooth {100}-Faceted Diamond Films, Diamond and Related Materials, 2, 1993, pp. 158-168.
Jiang et al., Heteroepitaxial Diamond Growth on (100) Silicon, Diamond and Related Materials, 2, 1993, pp. 1112-1113.
Cline et al, Cyclic Deposition of Diamond: Experimental Testing of Model Predictions, J. Appl. Phys. 72 (12), 15 Dec. 1992, pp. 5926-5940.
Klages, Chemical Vapor Deposition of Diamond, Appl. Phys. A, 56, 1993, pp. 513-526.
Stoner et al., Textured Diamond Growth on (100) .beta.-SiC Via Microwave Plasma Chemical Vapor Deposition, Appl. Phys. Lett. 60 (6), 10 Feb. 1992, pp. 698-700.
Popovici et al., Nucleation and Selective Deposition of Diamond Thin Films, Phys. Stat. Sol. (a), 132, 1992, pp. 233-252.
Wei et al., Deposition of Diamond Films With Controlled Nucleation and Growth Using Hot Filament CVD, Thin Solid Films, 212, 1992, pp. 91-95.
Geis et al., Large-Area Mosaic Diamond Films Approaching Single-Crystal Quality, Appl. Phys. Letter 58 (22), 3 Jun. 1991, pp. 2485-2487.
Zhu et al., Growth and Characterization of Diamond Films on Nondiamond Substrates for Electronic Applications, Proceedings of the IEEE, vol. 79, No. 5, May 1991, pp. 621-646.
Gildenblat et al., The Electrical Properties and Device Applications of Homoepitaxial and Polycrystalline Diamond Films, Proceedings of the IEEE, vol. 79, No. 5, May 1991, pp. 647-668.
Kobashi et al., Synthesis of Diamonds by Use of Microwave Plasma Chemical-Vapor Deposition: Morphology and Growth of Diamond Films, Physical Review B, vol. 38, No. 6, 15 Aug. 1988, pp. 4067-4084.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming diamond devices having textured and highly ori does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming diamond devices having textured and highly ori, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming diamond devices having textured and highly ori will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1278058

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.