Method of forming deposits from reactive gases

Coating processes – Coating by vapor – gas – or smoke

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427 93, 427 94, 427 95, 427248A, 427248B, 427248C, 427255, C23C 1100

Patent

active

041328183

ABSTRACT:
This describes an apparatus and method for providing a uniform deposition of a layer from a reactive gas over a large area load by entraining the reactive gas or gases in a carrier gas and sequentially changing the concentration of the reactive gas or gases and the flow rate of the carrier gas as they flow over the load to cause the time integrated deposition rate to be substantially constant over the entire surface of the load, thus depositing a uniformly thick layer over the entire area of the load. These changes in concentration and flow rate shift the center of distribution of the reaction rate across the load such that the time integral of such shifting results in a uniformity of deposition.

REFERENCES:
patent: 3112997 (1963-12-01), Benzing et al.
patent: 3736169 (1973-05-01), Graham et al.
patent: 3925146 (1975-12-01), Olsen et al.
patent: 3958071 (1976-05-01), Hieber et al.

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