Method of forming deposition films for use in multi-layer metall

Details Method of forming deposition films for use in multi-layer metall Method of forming deposition films for use in multi-layer metall

1975-12-16

1977-05-17

Mack, John H.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

118505, 204192EC, 204192E, 204192N, 427 39, 360110, C23C 1500

Patent

active

040240410

ABSTRACT:
A method of forming thin films wherein a film is formed through glow discharge such as ion plating or sputtering by using a mask whose surface in contact with the surface of the substrate on which the film is formed is provided with a thermostable elastic member, whereby the film, for use in multi-layer metallization, can be formed with high dimensional precision and intimacy.

REFERENCES:
patent: 3170810 (1965-02-01), Kagan
patent: 3661747 (1972-05-01), Byrnes, Jr. et al.
patent: 3723277 (1973-03-01), Schmiedecke
patent: 3791952 (1974-02-01), Labuda et al.
patent: 3897324 (1975-07-01), Del Monte et al.
F. W. Ingle "A Shadow Mask For Sputtered Films", Rev. Sci. Instruments, vol. 45, No. 11, Nov. 1974, pp. 1460-1461.

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