Method of forming crystalline silicon film and solar cell obtain

Batteries: thermoelectric and photoelectric – Photoelectric – Cells

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136256, 437 4, 437233, 437247, 437249, 437967, 264104, H01L 310236, H01L 3118, H01L 310368

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053782895

ABSTRACT:
A mold of crystalline silicon having a textured surface is placed on an amorphous silicon film so that projecting portions of the textured surface are in contact with a surface of the silicon film. The amorphous silicon film is then heated for crystallizing the same by solid phase epitaxy, thereby forming a crystalline silicon film having a textured surface corresponding to that of the mold.

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Doi, Atsutoshi, Appl. Phys. Lett. 59(20), "Solid phase epitaxial seed for laser-crystallized silicon on glass substrates", Nov. 11, 1991, pp. 2518-2520.
"Advantages of Textured Multicrystalline Silicon for MIS Inversion Layer Solar Cells" by R. Hezel and L. Hu; pp. 701-704 of the 1990 Technical Digest of the International PVSEC-5, held at Kyoto, Japan.

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