Method of forming coatings containing amorphous silicon carbide

Details Method of forming coatings containing amorphous silicon carbide Method of forming coatings containing amorphous silicon carbide

1989-04-12

1991-04-30

Weisstuch, Aaron

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427249, 4272552, 437100, 136258, B05D 306, C23C 1632, C23C 1650

Patent

active

050117068

ABSTRACT:
The invention is a method of forming a continuous coating of amorphous silicon carbide on the surface of articles by plasma enhanced chemical vapor deposition. In the method, the chemical vapor comprises a silicon-containing cyclobutane, such as a silacyclobutane or a 1,3-disilacyclobutane. The coatings formed by the invention are useful for application to solar cells, for preventing corrosion of electronic devices, for forming interlevel dielectric layers between metallization layers of electronic devices, and for providing abrasion resistance to surfaces.

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