Method of forming borderless contacts using a removable mandrel

Details Method of forming borderless contacts using a removable mandrel Method of forming borderless contacts using a removable mandrel

1992-09-17

1995-11-14

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

437948, 437233, 437 52, H01L 2144

Patent

active

054666368

ABSTRACT:
A semiconductor fabrication process for forming borderless contacts (130, 170, 172) using a removable mandrel (110). The process involves depositing a mandrel on an underlying barrier layer (100) designed to protect underlying structures (40) formed on a substrate (24). The mandrel is made from a material that will etch at a faster rate than the barrier layer so as to permit the formation of openings in the mandrel to be stopped on the barrier layer without penetrating such layer. After depositing a contact (130) in a first opening (120) formed in the mandrel, a second opening (140) is formed and a second contact (170) is deposited therein. Thereafter, the mandrel is removed and replaced with a layer of solid dielectric material (180).

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