Method of forming an iron oxide film by reacting sputtering with

Details Method of forming an iron oxide film by reacting sputtering with Method of forming an iron oxide film by reacting sputtering with

1987-02-02

1987-11-03

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419212, 20419215, 2041922, C23C 1400

Patent

active

047041994

ABSTRACT:
In a method of forming an iron oxide film of either Fe.sub.3 O.sub.4 or .alpha.-Fe.sub.2 O.sub.3 on a substrate with reactive sputtering of a target of iron, intensity of an emission spectrum of iron is previously determined as a predetermined value in connection with a desired one of Fe.sub.3 O.sub.4 and .alpha.-Fe.sub.2 O.sub.3 films. A light beam emitted from the glow discharge is measured to produce an electric signal representative of intensity of a measured spectrum of iron. Control operation is carried out to adjust the measured spectrum to the predetermined value. The electric signal may control either a flow rate of introducing oxygen gas into the space or intensity of an electric field produced between the substrate and the target.

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Chem. Abstracts, 98, #136473.

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