Method of forming an integrated resistor

Details Method of forming an integrated resistor Method of forming an integrated resistor

2005-10-05

2009-06-02

Sarkar, Asok K (Department: 2891)

Semiconductor device manufacturing: process

Making passive device

Resistor

C257SE21004, C438S381000

Reexamination Certificate

active

07541253

ABSTRACT:
In a semiconductor device, a thin film resistor is formed by making use of an interconnect structure and etching back the layers over the glue layer of the interconnect structure and using the glue layer as a thin film resistor.

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patent: 2005/0104107 (2005-05-01), Fazan et al.
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patent: 2005/0263769 (2005-12-01), Chul Ahn
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