Method of forming an integrated optical circuit

Details Method of forming an integrated optical circuit Method of forming an integrated optical circuit

2007-10-16

2007-10-16

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

C430S005000, C430S311000, C430S313000

Reexamination Certificate

active

10921645

ABSTRACT:
A method is disclosed for forming an optical circuit on a substrate. The method includes the deployment of a plurality of mask images to define an optical circuit image in photoresist. Each of the mask images define parts of the optical circuit and the totality of all mask images substantially define an optical circuit. A photolithography system globally aligns and exposes the mask images in photoresist. The resultant composite image is substantially indistinguishable from a single image of the entire optical circuit. Different images for each of the mask image parts can be substituted with other images or image parts and thereby exponentially increasing the number of circuit permutations from a predetermined number of available mask images. The method is also applicable to generating a unique optical circuit from a pre-existing library of reticle images. The images are printed in predetermined locations on a substrate to define the desired optical circuit.

REFERENCES:
patent: 5972567 (1999-10-01), Hu
patent: 6030752 (2000-02-01), Fulford
patent: 6337162 (2002-01-01), Irie
patent: 6517997 (2003-02-01), Roberts

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