Method of forming an integrated circuit spiral inductor with fer

Details Method of forming an integrated circuit spiral inductor with fer Method of forming an integrated circuit spiral inductor with fer

1997-10-14

2000-04-25

Bowers, Charles

Semiconductor device manufacturing: process

Having magnetic or ferroelectric component

438238, 336200, H01L 2100

Patent

active

060543299

ABSTRACT:
High quality factor (Q) spiral and toroidal inductor and transformer are disclosed that are compatible with silicon very large scale integration (VLSI) processing, consume a small IC area, and operate at high frequencies. The spiral inductor has a spiral metal coil deposited in a trench formed in a dielectric layer over a substrate. The metal coil is enclosed in ferromagnetic liner and cap layers, and is connected to an underpass contact through a metal filled via in the dielectric layer. The spiral inductor also includes ferromagnetic cores lines surrounded by the metal spiral coil. A spiral transformer is formed by vertically stacking two spiral inductors, or placing them side-by-side over a ferromagnetic bridge formed below the metal coils and cores lines. The toroidal inductor includes a toroidal metal coil with a core having ferromagnetic strips. The toroidal metal coil is segmented into two coils each having a pair of ports to form a toroidal transformer.

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