Method of forming an etched metal trace with reduced RF...

Details Method of forming an etched metal trace with reduced RF... Method of forming an etched metal trace with reduced RF...

2006-08-29

2006-08-29

Nguyen, Ha Tran (Department: 2812)

Semiconductor device manufacturing: process

Having magnetic or ferroelectric component

C438S381000

Reexamination Certificate

active

07098044

ABSTRACT:
The RF impedance of a metal trace at gigahertz frequencies is reduced by forming the metal trace to have a base region and a number of fingers that extend away from the base region. When formed to have a number of loops, the metal trace forms an inductor with an increased Q.

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