Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1997-05-01
1998-02-24
Gorgos, Kathryn L.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
427553, 75 1013, C01G 100, B05D 300
Patent
active
057208590
ABSTRACT:
An electrode is formed on a substrate such as a varistor, a PTC ceramic, or a piezoelectric ceramic by coating a surface of the substrate with a combination of a metal source and a source of reducing carbon. The substrate and/or the combination is an absorber of microwave radiation. Irradiation with microwave radiation causes a carbothermic reduction to occur, converting the metal source to a metal electrode on the substrate.
REFERENCES:
patent: 928398 (1909-07-01), Patterson et al.
patent: 934704 (1909-09-01), Zieme
patent: 1197693 (1916-09-01), Watkins
patent: 2429088 (1947-10-01), Box
patent: 4188651 (1980-02-01), Dornfeld et al.
patent: 4212045 (1980-07-01), Martzloff
patent: 4271045 (1981-06-01), Steigerwald et al.
patent: 4311520 (1982-01-01), Kruesi et al.
patent: 4321089 (1982-03-01), Kuresi et al.
patent: 4324582 (1982-04-01), Kruesi et al.
patent: 4364021 (1982-12-01), Levinson
patent: 4505787 (1985-03-01), Fuller et al.
patent: 4514321 (1985-04-01), Siuta et al.
patent: 4733018 (1988-03-01), Prabhu et al.
patent: 4747014 (1988-05-01), Kaino et al.
patent: 4987515 (1991-01-01), Iwaya et al.
patent: 5039452 (1991-08-01), Thompson et al.
patent: 5062891 (1991-11-01), Gruber et al.
patent: 5091820 (1992-02-01), Iwaya et al.
patent: 5131941 (1992-07-01), Lemelson
patent: 5321223 (1994-06-01), Kimrey et al.
patent: 5407473 (1995-04-01), Miura et al.
patent: 5410135 (1995-04-01), Pollart et al.
patent: 5443560 (1995-08-01), Deevi et al.
patent: 5471721 (1995-12-01), Haertling
patent: 5480834 (1996-01-01), Lake et al.
L'vov et al. Izv. Vyssh. Uchebn. Zaved., Chern. Metall. (1988), (9), pp. 10-13 no month available.
Mechev, Metally (1994), (1), pp. 41-45 no month available.
Vaidhyanathan et al., Chem. Mater. 1997 (9), pp. 1196-1200.
Ramesh et al., J. Mater. Res., vol. 9, No. 12, Dec. 1994, pp. 3025-3027.
Xu et al., J. Mater. Res., vol. 10, No. 2, Feb. 1995, pp. 334-338.
Sakai et al., Shigen to Sozai (1993), 109(8), 645-50 no month avialable.
Standish et al., Iron Steelmaker, 18(5), pp. 59-61 (May 1991).
L'vov et al., Zh. Anal. Khim. (1984), 39(10), pp. 1773-1780 no month available.
Sutton, Ceramic Trans., vol. 36, pp. 3-18 (1993) no month avialable.
Sutton, Ceramic Bull., Vol. 68, No. 2, pp. 376-386 (1989) no month available.
Tian, Ceramic Trans., vol. 21, pp. 283-300 (1991) no month avialable.
Shafizadeh, in Adv. Carbohydrate Chemistry, vol. 23, pp. 419-474 (Wolfrom et al., eds., Academic Press 1968) no month available.
Sun et al., IEEE Trans. Electron Devices, vol. ED-23, No. 8, pp. 961-966 (Aug. 1976).
Kumar et al., Ceramic Transactions, vol. 21, pp. 395-402 (1991) no month available.
Czubarow Pawel
Dupon Ryan
Evans Anthony
Jansons Viktors
Burkard Herbert G.
Chao Yuan
Gorgos Kathryn L.
Raychem Corporation
Wong Edna
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