Method of forming an adherent fluorosilane layer on a substrate

Details Method of forming an adherent fluorosilane layer on a substrate Method of forming an adherent fluorosilane layer on a substrate

1989-10-02

1991-04-23

Lawrence, Evan

Recorders

Markers and/or driving means therefor

With ink supply to marker

346 11, 427387, 4274071, 4274121, 4274125, 427409, G01D 1518, B05D 508, B05D 724

Patent

active

050103563

ABSTRACT:
A method of reducing the wettability of non-vitreous surfaces, and ink jet recording heads including a surface having reduced wettability, are provided wherein a layer of cured siloxane is formed on the non-vitreous surface and a layer comprising at least one fluorosilane is formed on the siloxane layer.

REFERENCES:
patent: 4006271 (1977-02-01), French et al.
patent: 4218508 (1980-08-01), Humphrey
patent: 4343013 (1982-08-01), Bader et al.
patent: 4368476 (1983-01-01), Uehara et al.
patent: 4479982 (1984-10-01), Nilsson et al.
patent: 4555062 (1985-11-01), You
patent: 4623906 (1986-11-01), Chandrashekhar et al.
patent: 4643948 (1987-02-01), Diaz et al.
R. Ramharack et al, "Fluoropolymers of Very Low Surface Energies", pp. 93-98, Journal of Polymer Science: Part C: Polymer Letters, vol. 25 (1987).
A. G. Pittman et al, "Polymers Derived from Fluoroketones. III. Monomer Synthesis, Polymerization, and Wetting Properties of Poly(allyl Ether) and Poly(vinyl Ether)*", pp. 1741-1750, Journal of Polymer Science: Part A-1 vol. 6 (1968).
D. F. Untereker et al, "Chemically Modified Electrodes", pp. 309-318, J. Electroanal Chem., 81 (1977).
K. L. Mittal et al, "Vapor Deposited Silanes and Other Coupling Agents", pp. 93-97, J. Adhesion, 1976, vol. 8.
Pittman et al, "Polymers Derived from Fluoroketones. IV. Poly (1,4-Bis(Heptafluoroisopropoxy)-2-Butene Oxide)", pp. 873-877, Polymer Letters vol. 8, (1970).
M. Mitsuya et al, "Structure of Vacuum-Deposited Perfluorocarboxylic Acid Film", pp. 287-289, Journal of Colloid and Interface Science, vol. 107, No. 1, Sep. 1985.
N. Higashi et al, "Stabilization and Facilitated Deposition of Surface Monolayers of Fluorocarbon Amphiphiles Through Polyion Complex Formation", pp. 105-108, Chemistry Letters (1986).
M. Bernett et al, "Wetting Properties of Tetrafluoroethylene and Hexafluoropropylene Copolymers", pp. 1292-1294, vol. 64, Sep. 1960.
M. Bernett et al, "Wetting Properties of Polyhexafluoropropylene", pp. 2266-2267, vol. 65, Dec. 1961.
V. R. Gray, "Contact Angles, Their Significance and Measurement", pp. 99-119, S.C.I. Monograph No. 25.
A. G. Pittman, "Surface Properties of Fluorocarbon Polymers", pp. 419-449, Agricultural Research Services, U.S. Department of Agriculture (undated).
W. A. Zisman, "Influence of Constitution on Adhesion", pp. 33-71, Handbook of Adhesives, Second Edition, (undated).
G. J. Ratchford, "Nozzle Plate", p. 1040, IBM Technical Disclosure Bulletin, vol. 26, No. 3A, Aug. 1983.
F. Anger, et al, "Low Surface Energy Fluoro-Epoxy Coating for Drop-On-Demand Nozzles", p. 431, IBM Technical Disclosure Bulletin, vol. 26, No. 1, Jun. 1983.
R. D. Balanson, et al, "Low Energy Coating for Drop-On Demand Silicone Nozzles", p. 294, IBM Technical Bulletin, vol. 23, No. 1, Jun. 1980.
J. I. Crowley et al, "Nozzles for Ink Jet Printers", p. 4371, IBM Technical Disclosure Bulletin, vol. 25, No. 8, Jan. 1983.
H. H. Weetall et al, "Porous Glass for Affinity Chromatography Applications", pp. 59-72, Methods of Chromatography, vol. 34 (undated).
J. Roitman et al, "Wetting Properties of Acrylic Polymers Containing Perfluoro-t-Butyl Side Chains", pp. 499-503, Polymer Letters vol. 10 (1972).
M. Bernett et al, "Wetting Properties of Acrylic and Methacrylic Polymers Containing Fluorinated Side Chains", pp. 207-208, J. Physics Chem., vol. 66, Jun. 1962.
English Abstract of Japanese Patent Application 61-167567, "Water Repellent Treatment of Ink Jet Head", Jul. 1986.
Kamimori et al, "Chemical Abstracts", vol. 81, p. 138, abstract No. 154763k, 1974.

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