Method of forming a wafer level package

Details Method of forming a wafer level package Method of forming a wafer level package

2008-12-04

2011-11-08

Nguyen, Ha Tran T (Department: 2829)

Semiconductor device manufacturing: process

Packaging or treatment of packaged semiconductor

Including adhesive bonding step

C438S113000, C257S676000, C257SE23039, C257SE23040

Reexamination Certificate

active

08053281

ABSTRACT:
A method is provided for forming a microelectronic package at a wafer level. Such method can include providing a semiconductor wafer having a surface with a pattern of electrical contacts thereon. An interposer component can be provided which has a compliant dielectric layer bonded to a conductive layer. A pattern of holes can be formed through the compliant dielectric layer and the conductive layer which corresponds to the pattern of electrical contacts. The compliant dielectric layer can be contacted with the semiconductor wafer surface so that the pattern of holes is in an aligned position with the pattern of contacts and the compliant dielectric layer and the semiconductor wafer surface then bonded in the aligned position to unite the semiconductor wafer and the interposer component to form a wafer level semiconductor package. The wafer level semiconductor package can be diced to form individual semiconductor chip packages.

REFERENCES:
patent: 5583378 (1996-12-01), Marrs et al.
patent: 6242283 (2001-06-01), Lo et al.
patent: 6389689 (2002-05-01), Heo
patent: 2006/0270107 (2006-11-01), Morrison et al.
patent: 2007/0215992 (2007-09-01), Shen et al.
patent: 2008/0042255 (2008-02-01), Chen

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