Method of forming a uniform photoresist film using gas flow

Details Method of forming a uniform photoresist film using gas flow Method of forming a uniform photoresist film using gas flow

1998-06-17

2000-03-14

Bareford, Katherine A.

Coating processes

With post-treatment of coating or coating material

Gas jet or blast mechanically treats coating

427127, 118 63, B05D 304

Patent

active

060370076

ABSTRACT:
A method for forming a photoresist film on a substrate, comprising: mounting a substrate on a supporting surface of a supporter so that a stepped portion is produced between the supporting surface and a top surface of the substrate; coating a photoresist on the top surface and a side surface of the substrate, the side surface showing up at the stepped portion; and then; blowing gas over the photoresist on the top surface to make the photoresist filmy.

REFERENCES:
patent: 4870519 (1989-09-01), White
patent: 5824361 (1998-10-01), Asanuma

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