Method of forming a transparent conductive film

Details Method of forming a transparent conductive film Method of forming a transparent conductive film

1990-03-01

1991-04-23

Pianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 38, 427 42, 427 47, 427109, 4271262, 4271263, 427314, 427322, B05D 306

Patent

active

050099221

ABSTRACT:
In a method of forming a transparent conductive film, an arc discharge type plasma produced by arc discharging is generated in an atmosphere wherein the pressure of an atmospheric gas is 3.0 .times. 10.sup.-4 Torr or higher; the plasma is converged onto a vapor deposition material for forming a transparent conductive film to thereby evaporate the vapor deposition material, whereby said transparent conductive film is formed on a substrate located above said vapor deposition material.

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