Method of forming a thin film of a metal or metal compound on a

Coating processes – Interior of hollow article coating – Coating by vapor – gas – mist – or smoke

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

427250, 427253, 427255, 4272552, 4272557, 427404, 4274197, B05D 722, C23C 1606

Patent

active

046506985

ABSTRACT:
A method of forming with good reproducibility a high-quality thin film of a metal or metal compound by a vapor growth method on a substrate placed in a quartz reaction tube which has the steps of, prior to the formation of the thin film forming an intermediate film of a material having good adhesion with both quartz, and the metal or metal compound on the inner wall of the reaction tube, and forming a film of the metal or metal compound for the thin film on the intermediate film.

REFERENCES:
patent: 2884894 (1959-05-01), Ruppert et al.
patent: 4180596 (1979-12-01), Crowder et al.
patent: 4391846 (1983-07-01), Raymond

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming a thin film of a metal or metal compound on a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a thin film of a metal or metal compound on a , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a thin film of a metal or metal compound on a will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1787987

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.