Method of forming a thin film iris diaphragm for a corpuscular b

Details Method of forming a thin film iris diaphragm for a corpuscular b Method of forming a thin film iris diaphragm for a corpuscular b

1975-05-21

1976-10-26

Powell, William A.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 36, 156 7, 156 18, 204 18R, 204 23, 204 38B, 250505, 427264, 427265, G21K 100

Patent

active

039881539

ABSTRACT:
A method of forming an iris diaphragm for use in a corpuscular beam apparatus and having a thin metal layer with at least one opening and an integral reinforcing portion of the same metal which is set back from each of the openings characterized by providing a substrate with the first mask leaving an unexposed surface of the configuration of the thin metal layer, applying a thin metal layer on the exposed surface, forming a second mask having configuration of the reinforcing portion of the iris diaphragm and including a portion covering the thin metal layer adjacent each opening, applying a second thicker layer of the same metal to form a reinforcing portion and subsequently removing the iris diaphragm from the surface of the substrate. Preferably, each of the masks are formed by a photo development process and the metal layers are applied by electro-depositing.

REFERENCES:
patent: 2874101 (1959-02-01), Larson
patent: 3227880 (1966-01-01), Wideroe
patent: 3421000 (1969-01-01), Lieber et al.
patent: 3449221 (1969-06-01), Thomas
patent: 3847689 (1974-11-01), Fletcher et al.

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