Method of forming a thin film and apparatus of forming a metal t

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

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257765, H01L 2348, H01L 2352, H01L 2940

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active

055942806

ABSTRACT:
In an electronic device, an interconnect utilizes a flat substrate and a layer bonded to the substrate. The layer may have a through hole formed therein or be formed from parallel spaced layers. An aluminum or aluminum alloy film having single crystallinity is deposited within the through hole or void step created between parallel spaced layers.

REFERENCES:
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