Method of forming a thin aluminum film

Details Method of forming a thin aluminum film Method of forming a thin aluminum film

1987-11-27

1989-05-09

Fianalto, Bernard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 99, 427124, 427250, 427255, 4272551, 427294, B05D 306

Patent

active

048288705

ABSTRACT:
A method for depositing a thin aluminum film in a vacuum on a surface of a substrate which comprises the steps of:

REFERENCES:
patent: 4634600 (1987-01-01), Shimizu et al.
patent: 4683149 (1987-07-01), Suzuki
Yamada, Takaoka, Usui & Takagi, "Low Temperature Epitaxy by Ionized Cluster Beam", in the Journal of Vacuum Science & Technology A, pp. 722-727.

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