Method of forming a stacked device filler

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S456000

Reexamination Certificate

active

07320928

ABSTRACT:
Numerous embodiments of a stacked device filler and a method of formation are disclosed. In one embodiment, a method of forming a stacked device filler comprises forming a material layer between two or more substrates of a stacked device, and causing a reaction in at least a portion of the material, wherein the reaction may comprise polymerization, and the material layer may be one or a combination of materials, such as nonconductive polymer materials, for example.

REFERENCES:
patent: 5074947 (1991-12-01), Estes et al.
patent: 5086558 (1992-02-01), Grube et al.
patent: 5087664 (1992-02-01), Sugino et al.
patent: 5514378 (1996-05-01), Mikos et al.
patent: 5726805 (1998-03-01), Kaushik et al.
patent: 5756021 (1998-05-01), Hedrick et al.
patent: 5763498 (1998-06-01), Knaus
patent: 5821621 (1998-10-01), Jeng
patent: 5846853 (1998-12-01), Otsuki et al.
patent: 6121689 (2000-09-01), Capote et al.
patent: 6168737 (2001-01-01), Poco et al.
patent: 6319837 (2001-11-01), Chittipeddi et al.
patent: 6403382 (2002-06-01), Zhu et al.
patent: 6452650 (2002-09-01), Nakao et al.
patent: 6486903 (2002-11-01), Wagner et al.
patent: 6548176 (2003-04-01), Gwo
patent: 6555477 (2003-04-01), Lu et al.
patent: 6570221 (2003-05-01), Allman
patent: 6696352 (2004-02-01), Carr et al.
patent: 6908784 (2005-06-01), Farnworth et al.
patent: 2002/0015519 (2002-02-01), Tokas et al.
patent: 2002/0093104 (2002-07-01), Goldmann et al.
patent: 2002/0109228 (2002-08-01), Buchwalter et al.
patent: 2002/0134503 (2002-09-01), Hussinger et al.
patent: 2002/0155661 (2002-10-01), Massingill et al.
patent: 2002/0160139 (2002-10-01), Huang et al.
patent: 2003/0082904 (2003-05-01), Saka et al.
patent: 2003/0098700 (2003-05-01), Yoshida et al.
patent: 2003/0138553 (2003-07-01), Takenaka et al.
patent: 2003/0140959 (2003-07-01), Gaudiana et al.
patent: 2003/0148596 (2003-08-01), Kellar et al.
patent: 2003/0192584 (2003-10-01), Beckenbaugh et al.
patent: 2003/0197941 (2003-10-01), Ohgane
patent: 2003/0203668 (2003-10-01), Cobbley et al.
patent: 2003/0215689 (2003-11-01), Keegan
patent: 2004/0077075 (2004-04-01), Jensen et al.
patent: 2004/0137826 (2004-07-01), Gagliardi
patent: 2004/0212030 (2004-10-01), Motoo
patent: 2004/0256967 (2004-12-01), Downing et al.
Stanley Wolf PH.D and Richard N. Tauber Ph.D. in Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, 1986, pp. 539-542.
Stanley Wolf PH.D. and Richard N. Tauber PH.D. in Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, 1986, pp. 430-441, 518-9.
Office Action for U.S. Appl. No. 10/814,083 mailed May 30, 2006 (11 pages).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming a stacked device filler does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a stacked device filler, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a stacked device filler will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2809780

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.