Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates
Reexamination Certificate
2008-01-22
2008-01-22
Coleman, William D. (Department: 2823)
Semiconductor device manufacturing: process
Bonding of plural semiconductor substrates
C438S456000
Reexamination Certificate
active
07320928
ABSTRACT:
Numerous embodiments of a stacked device filler and a method of formation are disclosed. In one embodiment, a method of forming a stacked device filler comprises forming a material layer between two or more substrates of a stacked device, and causing a reaction in at least a portion of the material, wherein the reaction may comprise polymerization, and the material layer may be one or a combination of materials, such as nonconductive polymer materials, for example.
REFERENCES:
patent: 5074947 (1991-12-01), Estes et al.
patent: 5086558 (1992-02-01), Grube et al.
patent: 5087664 (1992-02-01), Sugino et al.
patent: 5514378 (1996-05-01), Mikos et al.
patent: 5726805 (1998-03-01), Kaushik et al.
patent: 5756021 (1998-05-01), Hedrick et al.
patent: 5763498 (1998-06-01), Knaus
patent: 5821621 (1998-10-01), Jeng
patent: 5846853 (1998-12-01), Otsuki et al.
patent: 6121689 (2000-09-01), Capote et al.
patent: 6168737 (2001-01-01), Poco et al.
patent: 6319837 (2001-11-01), Chittipeddi et al.
patent: 6403382 (2002-06-01), Zhu et al.
patent: 6452650 (2002-09-01), Nakao et al.
patent: 6486903 (2002-11-01), Wagner et al.
patent: 6548176 (2003-04-01), Gwo
patent: 6555477 (2003-04-01), Lu et al.
patent: 6570221 (2003-05-01), Allman
patent: 6696352 (2004-02-01), Carr et al.
patent: 6908784 (2005-06-01), Farnworth et al.
patent: 2002/0015519 (2002-02-01), Tokas et al.
patent: 2002/0093104 (2002-07-01), Goldmann et al.
patent: 2002/0109228 (2002-08-01), Buchwalter et al.
patent: 2002/0134503 (2002-09-01), Hussinger et al.
patent: 2002/0155661 (2002-10-01), Massingill et al.
patent: 2002/0160139 (2002-10-01), Huang et al.
patent: 2003/0082904 (2003-05-01), Saka et al.
patent: 2003/0098700 (2003-05-01), Yoshida et al.
patent: 2003/0138553 (2003-07-01), Takenaka et al.
patent: 2003/0140959 (2003-07-01), Gaudiana et al.
patent: 2003/0148596 (2003-08-01), Kellar et al.
patent: 2003/0192584 (2003-10-01), Beckenbaugh et al.
patent: 2003/0197941 (2003-10-01), Ohgane
patent: 2003/0203668 (2003-10-01), Cobbley et al.
patent: 2003/0215689 (2003-11-01), Keegan
patent: 2004/0077075 (2004-04-01), Jensen et al.
patent: 2004/0137826 (2004-07-01), Gagliardi
patent: 2004/0212030 (2004-10-01), Motoo
patent: 2004/0256967 (2004-12-01), Downing et al.
Stanley Wolf PH.D and Richard N. Tauber Ph.D. in Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, 1986, pp. 539-542.
Stanley Wolf PH.D. and Richard N. Tauber PH.D. in Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, 1986, pp. 430-441, 518-9.
Office Action for U.S. Appl. No. 10/814,083 mailed May 30, 2006 (11 pages).
Kloster Grant M.
Ramanathan Shriram
Staintes David
Blakely , Sokoloff, Taylor & Zafman LLP
Coleman William D.
Intel Corporation
Nguyen Khiem D
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