Method of forming a serrated surface topography

Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating

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156654, 219121EM, 428167, C23C 1500

Patent

active

040160629

ABSTRACT:
A method of forming a serrated surface topography useful for the unidirectional propagation of magnetic domains is disclosed. The method includes the step of forming a substantially rectangular wave topograhy on the surface of the structure and subsequently ion milling the rectangular wave topography at an oblique angle of incidence to form the serrated surface topography.

REFERENCES:
patent: 3860783 (1975-01-01), Schmidt et al.
patent: 3904462 (1975-09-01), Dimigen et al.
H. L. Garvin, "High Resolution Fabrication by Ion Beam Sputtering," Solid State Technology, Nov. 1973, pp. 531-536.
P. G. Gloersen, "Ion Beam Etching," J. Vac. Sci. Tech., vol. 12, No. 1, Jan., Feb. 1975, pp. 28-35.

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